The most advanced broad ion beam system for producing exceptionally
high-quality cross-section or flat-milling samples for electron
| Product Description | |
|---|---|
| Gas used | Ar (argon) gas |
| Accelerating voltage | 0 to 8 kV |
| Cross-section Milling | |
| Maximum milling rate (Material: Si) | ≥ 1 mm/h*1 |
| Maximum milling width | 8 mm (with using a wide-area cross-sectional milling holder) |
| Sample moving range | X ±7 mm, Y 0 to +3 mm |
| Ion beam intermittent irradiation | Standard function |
| Swing angle | ±15°, ±30°, ±40° |
| General Characteristic | |
| Maximum sample size | 20(W) × 12(D) × 7(H) mm |
| Flat Milling | |
| Milling area | φ32 mm |
| Maximum sample size | φ50 × 25(H) mm |
| Sample moving range | X 0 to +5 mm |
| Ion beam intermittent irradiation | Standard function |
| Rotation speed | 1 rpm, 25 rpm |
| Tilt | 0 to 90° |
| Ion Milling System ArBlade 5000_compressed.pdf |
|---|
